The quartz baffle with holes is a precision-engineered component designed to optimize gas flow and temperature uniformity within semiconductor and photovoltaic furnace systems. Made from high-purity fused quartz, it offers excellent thermal shock resistance, chemical inertness, and structural stability at elevated temperatures.

Strategically positioned inside reaction tubes or chambers, the baffle helps to evenly distribute process gases, reduce turbulence, and minimize particle contamination. Its robust design withstands repeated thermal cycling, maintaining consistent performance during diffusion, oxidation, LPCVD, and annealing processes.

Function of the Holes on the Quartz Baffles

The holes on a quartz baffle serve several critical functions in semiconductor wafer processing:

• Even Gas Distribution – They allow process gases (e.g., oxygen, nitrogen, or dopant gases) to flow uniformly across the wafers, preventing uneven exposure.
• Thermal Uniformity – By allowing controlled gas flow, the holes help maintain a stable temperature across all wafer surfaces, reducing hot spots.
• Contamination Control – The holes help prevent backflow or turbulence that could carry particles to the wafer surface, improving process cleanliness.
• Enhanced Process Efficiency – Properly designed holes optimize gas mixing and diffusion, leading to more consistent film deposition or oxidation results.

In short, the holes transform the baffle from a simple barrier into a precision flow-control device that ensures uniform and reliable wafer processing.