Name:
6-inch Quartz Baffle
Function & Application:
The quartz baffle guides and evenly distributes process gases to ensure stable gas flow and temperature during wafer production. It is used to disperse gas flow and maintain consistent gas exposure to wafers inside the quartz boat. This component is applied in diffusion, oxidation, and CVD deposition processes in wafer manufacturing, which are high-temperature processes.
Performance Requirements:
High temperature resistance, corrosion resistance, excellent thermal stability, sandblasted surface, and low impurity content.
No.5177 Qianghua West Road, Dongqian Street, Nanxun District, Huzhou City, Zhejiang Province
+86-572-3032373
+86-572-3033016
High-Temperature Quartz Baffles are critical components designed to regulate and evenly distribute process gases within semiconductor furnaces during high-temperature operations such as diffusion, oxidation, and CVD deposition. By guiding gas flow, these baffles help maintain stable temperature and uniform gas exposure across all wafers in the quartz boat, enhancing process consistency and wafer quality.
Constructed from high-purity fused quartz, these baffles exhibit exceptional thermal stability, corrosion resistance, and low impurity content, essential for contamination-free processing. The sandblasted surface reduces particle generation and improves thermal performance. Engineered to withstand rigorous thermal cycling, these quartz baffles are ideal for both production environments and research applications demanding precise gas flow control and temperature uniformity.
Repeated heating and cooling cycles can cause thermal stress, leading to cracks or fractures in the quartz baffle.
Prevention: Use high-purity quartz with low thermal expansion and ensure controlled ramp-up and cool-down rates in furnace operation.
Improper installation or excessive mechanical stress can cause baffles to warp, affecting gas flow and wafer alignment.
Prevention: Handle baffles carefully during installation and design for appropriate thickness and support structures.
Deposits from process gases or particulate matter can accumulate on the baffle surface, affecting thermal uniformity and wafer purity.
Prevention: Perform regular cleaning using appropriate non-abrasive methods and maintain cleanroom standards.
Incorrect positioning of baffles can disrupt gas flow distribution, creating hotspots or uneven wafer exposure.
Prevention: Ensure precise alignment with wafer boats and furnace guides during installation.
Exposure to aggressive process gases over time can slowly erode the quartz surface.
Prevention: Choose high-purity, corrosion-resistant quartz and monitor the baffle’s condition regularly.
By understanding these common issues and implementing preventive measures, semiconductor manufacturers can maintain optimal performance of quartz baffles, ensuring consistent wafer quality, improved process yield, and longer component life.