High?Purity Quartz Flow Equalization Plates are precision-engineered components designed to regulate and stabilize the flow of process gases during high-temperature semiconductor manufacturing steps such as diffusion, oxidation, and CVD deposition. Installed within the furnace system, these plates guide and evenly distribute gas across the wafer surface, helping to maintain uniform gas concentration and temperature throughout the quartz boat.

Made from high-purity fused quartz, these plates offer outstanding thermal stability, excellent resistance to chemical corrosion, and extremely low impurity content—ensuring clean and controlled processing environments. The sandblasted surface improves gas dispersion performance while minimizing particle generation. By promoting consistent gas exposure, these plates contribute to improved layer uniformity, reduced defect rates, and higher process yields in both production lines and R&D settings.