Quartz Baffles for Horizontal Furnace are specialized components designed to optimize thermal distribution and protect silicon wafers during high-temperature semiconductor processes such as diffusion, oxidation, and CVD deposition. Made from high-purity fused quartz, these baffles reflect and diffuse thermal energy within the furnace tube, helping to eliminate localized hotspots and ensuring uniform heat exposure across all wafers.

By acting as a thermal barrier, the baffles reduce direct radiation on wafer surfaces, thereby minimizing thermal stress and improving overall process consistency. The sandblasted surface treatment enhances thermal performance while minimizing particle generation. With excellent resistance to heat, chemical corrosion, and thermal shock, and with ultra-low impurity content, these quartz baffles are ideal for horizontal furnace setups in both production and R&D environments.