In achieving quality control for thin films in devices, the correct dosing of processing gases is essential throughout every step of semiconductor fabrication. The 6 inch high purity quartz injector has been constructed for the purpose of uniform gas injection into reaction chambers, ensuring clean distribution free of contamination.

This high purity quartz gas injector is custom-made for advanced processing equipment, as the ultra pure quartz can withstand extreme thermal and chemical conditions. The slow and smooth gas flow exhibited by the high purity quartz gas injector is contributed to by the custom reconstruction of internal channels, which reduce turbulence and guarantees that every single wafer is homogeneously exposed to gas.