In semiconductor manufacturing, controlling the furnace atmosphere with precision is essential to prevent contamination and ensure uniform processing. The 6 inch quartz purge baffle is engineered to manage and direct purge gases effectively, minimizing stagnant zones and promoting consistent gas exchange throughout the chamber.

Fabricated from high-purity quartz using advanced shaping and thermal treatment techniques, this baffle is designed to withstand the corrosive, high-temperature environment typical of purge cycles. Its optimized geometry is the result of detailed flow analysis, ensuring efficient removal of unwanted by-products and impurities without disrupting wafer positioning or thermal profiles.