Name:
6-inch Quartz Flow Equalization Plate
Function & Application:
The quartz flow equalization plate guides and evenly distributes process gases to ensure stable gas flow and temperature during wafer production. It is used to disperse gas flow and maintain consistent gas exposure to wafers inside the quartz boat. This component is applied in diffusion, oxidation, and CVD deposition processes in wafer manufacturing, which are high-temperature processes.
Performance Requirements:
High temperature resistance, corrosion resistance, excellent thermal stability, high optical transparency, and low impurity content.
No.5177 Qianghua West Road, Dongqian Street, Nanxun District, Huzhou City, Zhejiang Province
+86-572-3032373
+86-572-3033016
In semiconductor manufacturing, controlling the furnace atmosphere with precision is essential to prevent contamination and ensure uniform processing. The 6 inch quartz purge baffle is engineered to manage and direct purge gases effectively, minimizing stagnant zones and promoting consistent gas exchange throughout the chamber.
Fabricated from high-purity quartz using advanced shaping and thermal treatment techniques, this baffle is designed to withstand the corrosive, high-temperature environment typical of purge cycles. Its optimized geometry is the result of detailed flow analysis, ensuring efficient removal of unwanted by-products and impurities without disrupting wafer positioning or thermal profiles.