The Epitaxial Quartz Base is a precision-engineered component essential for semiconductor epitaxial processes, particularly during high-energy ion implantation. Crafted from ultra-pure fused quartz, it offers exceptional resistance to extreme temperatures, chemical corrosion, and gas erosion, ensuring long-term durability and process reliability.

Designed with a sandblasted surface, the base provides precise thermal field control critical for accurate ion beam doping and uniform epitaxial layer deposition. Its low impurity content minimizes contamination risks, maintaining cleanroom standards and enhancing wafer quality. Ideal for advanced epitaxy equipment, the quartz base supports consistent, high-yield semiconductor manufacturing under demanding high-temperature conditions.